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TECHNICAL PAPERS

Elastic Stress Concentration of an Ellipsoidal Inclusion of Revolution in the Vicinity of a Bimaterial Interface

[+] Author and Article Information
Nao-Aki Noda, Yasuhiro Moriyama

Mechanical Engineering Department, Kyushu Institute of Technology, 1-1, Sensui-cho, Tobata, Kitakyushu 804-8550, Japan

J. Eng. Mater. Technol 126(3), 292-302 (Jun 29, 2004) (11 pages) doi:10.1115/1.1752927 History: Received March 20, 2003; Revised July 23, 2003; Online June 29, 2004

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References

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Figures

Grahic Jump Location
An ellipsoidal inclusion in the vicinity of a bimaterial interface
Grahic Jump Location
Interface stress of an ellipsoidal inclusion for b/d→0 in Fig. 1: (a) σ, when EI/EM1<1; and (b) σn when EI/EM1>1
Grahic Jump Location
Method of solution: (a) Matrix; and (b) Inclusion
Grahic Jump Location
Interface stress σt for EI/EM1=EM2/EM1=0,σz=1,σr1r2=0 in Fig. 1
Grahic Jump Location
Interface stress σn for EI/EM1=EM2/EM1=∞,σz=1,σr1r2=0 in Fig. 1
Grahic Jump Location
Interface stress σt for EI/EM1=0,a/b=2,σz=1,σr1r2=0 in Fig. 1
Grahic Jump Location
Interface stress σn for EI/EM1=∞,a/b=1/4,σz=1,σr1r2=0 in Fig. 1

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