Elastic Stress Concentration of an Ellipsoidal Inclusion of Revolution in the Vicinity of a Bimaterial Interface

[+] Author and Article Information
Nao-Aki Noda, Yasuhiro Moriyama

Mechanical Engineering Department, Kyushu Institute of Technology, 1-1, Sensui-cho, Tobata, Kitakyushu 804-8550, Japan

J. Eng. Mater. Technol 126(3), 292-302 (Jun 29, 2004) (11 pages) doi:10.1115/1.1752927 History: Received March 20, 2003; Revised July 23, 2003; Online June 29, 2004

First Page Preview

View Large
First page PDF preview
Your Session has timed out. Please sign back in to continue.



Grahic Jump Location
An ellipsoidal inclusion in the vicinity of a bimaterial interface
Grahic Jump Location
Interface stress of an ellipsoidal inclusion for b/d→0 in Fig. 1: (a) σ, when EI/EM1<1; and (b) σn when EI/EM1>1
Grahic Jump Location
Method of solution: (a) Matrix; and (b) Inclusion
Grahic Jump Location
Interface stress σt for EI/EM1=EM2/EM1=0,σz=1,σr1r2=0 in Fig. 1
Grahic Jump Location
Interface stress σn for EI/EM1=EM2/EM1=∞,σz=1,σr1r2=0 in Fig. 1
Grahic Jump Location
Interface stress σt for EI/EM1=0,a/b=2,σz=1,σr1r2=0 in Fig. 1
Grahic Jump Location
Interface stress σn for EI/EM1=∞,a/b=1/4,σz=1,σr1r2=0 in Fig. 1




Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging and repositioning the boxes below.

Related Journal Articles
Related eBook Content
Topic Collections

Sorry! You do not have access to this content. For assistance or to subscribe, please contact us:

  • TELEPHONE: 1-800-843-2763 (Toll-free in the USA)
  • EMAIL: asmedigitalcollection@asme.org
Sign In