A Model of Residual Stress in the Fabrication of Thin Glass Films

[+] Author and Article Information
P. E. Murray

Idaho National Engineering Laboratory, Lockheed Idaho Technologies Company, Mail Stop 3808, Idaho Falls, ID 83415

J. Eng. Mater. Technol 118(2), 213-216 (Apr 01, 1996) (4 pages) doi:10.1115/1.2804889 History: Received January 01, 1995; Revised June 04, 1995; Online November 27, 2007


We investigate the residual stress which occurs during fabrication of thin glass films. This research involves an innovative approach to modeling of residual stress which will be used to resolve important scientific issues related to the manufacturing of thin glass films for semiconductor devices. The validity of our results is confirmed by comparing analytical predictions of stress in glass films and experimental data reported previously.

Copyright © 1996 by The American Society of Mechanical Engineers
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